Japan Intellectual Property Rights: POSITIVE ELECTRODE PRECURSOR AND POSITIVE ELECTRODE SLURRY

Japan, Feb. 27 -- ASAHI KASEI CORP has got intellectual property rights for 'POSITIVE ELECTRODE PRECURSOR AND POSITIVE ELECTRODE SLURRY.' Other related details are as follows: Application Number: JP,2022-115810 Category (FI): H01M4/13,H01G11/50,H01M4/139,H01G11/38,H01M4/62@Z,H01M4/583 Stage: PROBLEM TO BE SOLVED: To provide a positive electrode precursor for a non-water system hybrid capacitor with excellent high-output and input and high temperature durability, capable of attaining reduction...


Japan Intellectual Property Rights: RADIO WAVE TRANSCEIVER, DISTRIBUTED PHASED ARRAY ANTENNA SYSTEM, DISTRIBUTED ELECTROMAGNETIC WAVE OBSERVATION DATA COLLECTION SYSTEM, AND DISTRIBUTED SYNTHETIC APERTURE RADAR SYSTEM

Japan, Feb. 27 -- NATIONAL INSTITUTE OF INFORMATION & COMMUNICATIONS TECHNOLOGY has got intellectual property rights for 'RADIO WAVE TRANSCEIVER, DISTRIBUTED PHASED ARRAY ANTENNA SYSTEM, DISTRIBUTED ELECTROMAGNETIC WAVE OBSERVATION DATA COLLECTION SYSTEM, AND DISTRIBUTED SYNTHETIC APERTURE RADAR SYSTEM.' Other related details are as follows: Application Number: JP,2022-114731 Category (FI): G01S13/87,G01S13/90,G01S7/02,216 Stage: PROBLEM TO BE SOLVED: To provide a radio wave transceiver that ...


Japan Intellectual Property Rights: RADIO WAVE TRANSCEIVER, DISTRIBUTED PHASED ARRAY ANTENNA SYSTEM, DISTRIBUTED ELECTROMAGNETIC WAVE OBSERVATION DATA COLLECTION SYSTEM, AND DISTRIBUTED SYNTHETIC APERTURE RADAR SYSTEM

Japan, Feb. 27 -- NATIONAL INSTITUTE OF INFORMATION & COMMUNICATIONS TECHNOLOGY has got intellectual property rights for 'RADIO WAVE TRANSCEIVER, DISTRIBUTED PHASED ARRAY ANTENNA SYSTEM, DISTRIBUTED ELECTROMAGNETIC WAVE OBSERVATION DATA COLLECTION SYSTEM, AND DISTRIBUTED SYNTHETIC APERTURE RADAR SYSTEM.' Other related details are as follows: Application Number: JP,2022-114731 Category (FI): G01S13/87,G01S13/90,G01S7/02,216 Stage: PROBLEM TO BE SOLVED: To provide a radio wave transceiver that ...


Japan Intellectual Property Rights: VEHICLE SEAT

Japan, Feb. 27 -- NHK SPRING CO LTD has got intellectual property rights for 'VEHICLE SEAT.' Other related details are as follows: Application Number: JP,2022-114403 Category (FI): B60N2/16 Stage: PROBLEM TO BE SOLVED: To inhibit a backlash of a second shaft member against a first shaft member.SOLUTION: A vehicle seat includes: an inner tube 42; and an outer tube 44 which is configured so that the inner tube 42 is inserted thereinto and located inside the inner tube 42. When a seat position o...


Japan Intellectual Property Rights: VEHICLE SEAT

Japan, Feb. 27 -- NHK SPRING CO LTD has got intellectual property rights for 'VEHICLE SEAT.' Other related details are as follows: Application Number: JP,2022-114403 Category (FI): B60N2/16 Stage: PROBLEM TO BE SOLVED: To inhibit a backlash of a second shaft member against a first shaft member.SOLUTION: A vehicle seat includes: an inner tube 42; and an outer tube 44 which is configured so that the inner tube 42 is inserted thereinto and located inside the inner tube 42. When a seat position o...


Japan Intellectual Property Rights: VEHICLE SEAT

Japan, Feb. 27 -- NHK SPRING CO LTD has got intellectual property rights for 'VEHICLE SEAT.' Other related details are as follows: Application Number: JP,2022-114403 Category (FI): B60N2/16 Stage: PROBLEM TO BE SOLVED: To inhibit a backlash of a second shaft member against a first shaft member.SOLUTION: A vehicle seat includes: an inner tube 42; and an outer tube 44 which is configured so that the inner tube 42 is inserted thereinto and located inside the inner tube 42. When a seat position o...


Japan Intellectual Property Rights: SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY

Japan, Feb. 27 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY.' Other related details are as follows: Application Number: JP,2022-110715 Category (FI): H10P14/24,H10P14/60,101@C,H10P50/20,101@C,H01L21/302,101@C,H01L21/205,H01L21/31@C,H05H1/46@L Stage: PROBLEM TO BE SOLVED: To improve controllability with respect to the uniformity of plasma processing.SOLUTION: A substrate processing device compr...


Japan Intellectual Property Rights: SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY

Japan, Feb. 27 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY.' Other related details are as follows: Application Number: JP,2022-110715 Category (FI): H10P14/24,H10P14/60,101@C,H10P50/20,101@C,H01L21/302,101@C,H01L21/205,H01L21/31@C,H05H1/46@L Stage: PROBLEM TO BE SOLVED: To improve controllability with respect to the uniformity of plasma processing.SOLUTION: A substrate processing device compr...


Japan Intellectual Property Rights: SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY

Japan, Feb. 27 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND GAS SUPPLY ASSEMBLY.' Other related details are as follows: Application Number: JP,2022-110715 Category (FI): H10P14/24,H10P14/60,101@C,H10P50/20,101@C,H01L21/302,101@C,H01L21/205,H01L21/31@C,H05H1/46@L Stage: PROBLEM TO BE SOLVED: To improve controllability with respect to the uniformity of plasma processing.SOLUTION: A substrate processing device compr...


Japan Intellectual Property Rights: INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, COMPUTER PROGRAM, AND INFORMATION PROCESSING SYSTEM

Japan, Feb. 27 -- TOSHIBA ENERGY SYSTEM&SOLUTION CORP,TOSHIBA CORP has got intellectual property rights for 'INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, COMPUTER PROGRAM, AND INFORMATION PROCESSING SYSTEM.' Other related details are as follows: Application Number: JP,2022-107249 Category (FI): H02J3/00,170,H02J101:24,H02J101:22,H02J101:20,H02J3/38,H02J3/00,H01M8/12,101,H01M8/10,101,H02J3/32,H02J7/35@K,H01M8/00@Z,H01M8/04@Z,H02J3/38,130,H02J3/38,170,H02J3/00,130,H02J103:50,H02...